CIMdata PLM Industry Summary Online Archive
7 July 2004
Product News
Mentor Graphics Offers Technology Design Kit and Design Flow for SMIC 0.18-micron Mixed-Signal Process
Mentor Graphics Corporation and Semiconductor Manufacturing International Corporation, SMIC ( http://www.smics.com ) announced the availability of a Technology Design Kit (TDK) for SMIC's 0.18um mixed-signal process technology. The open-source design kit, built for use with the Mentor Graphics® Analog/Mixed-Signal (AMS) IC Design Flow, enables IC design companies to set up all aspects of their design environment-including schematic entry, simulation, layout, verification and parasitic extraction-using the SMIC 0.18um process technology.
"Setting up a mixed-signal design environment is often time- and labor-intensive," said Jue-Hsien Chern, vice president and general manager, Deep Submicron (DSM) division, Mentor Graphics. "Mentor is committed to offering customers TDKs to simplify and accelerate this process, so we are pleased to be working with SMIC to support its mainstream 0.18um process technology."
"Our 0.18um process, together with Mentor's best-in-class mixed-signal IC design flow, can meet the most stringent design and manufacturing requirements of our customers," said Paul Ouyang, Fellow of Design Services Division, SMIC. "With this design kit, our customers can enjoy improved predictability and productivity of their designs with a rapid and confident path to silicon success."
SMIC's customers who have benefited from this design kit include Pixelworks, a provider of system-on-chip ICs for the advanced display market. "The Mentor/SMIC TDK helped us realize critical time savings, enabling us to meet our goals for getting to market rapidly," said Mike West, vice president and Fellow at Pixelworks. "We were able to ramp up a new design start in a fraction of the time using this TDK. In addition, foundry-qualified parameterized device generators in the TDK, along with IC Station's LDL (Logic-Driven Layout) Cockpit, facilitated easy and relatively painless migration of our designs from an earlier process technology to the new SMIC 0.18um process."
The new design kit includes the SMIC-supported EldoT analog simulation models and Calibre® DRC, LVS and extraction technology files. They also include schematic symbols for the Design Architect®-IC tool, programmable device generators for schematic-driven layout with IC Station®, process definition files, and all other configuration files necessary for the effective utilization of the Mentor Graphics complete AMS IC design flow.
The TDK has been validated and is now available for use with the Mentor Graphics ( http://www.mentor.com ) AMS IC Design Flow. To access this release, visit the Mentor Web site or contact SMIC at Design_Services@smics.com
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