CIMdata PLM Industry Summary Online Archive
19 July 2004
Product News
VeriSilicon and Magma Team to Deliver ``Magma-Ready'' Libraries for China-Based Wafer Foundries
VeriSilicon Holdings Co., Ltd. an IP and design service provider for China-based wafer foundries, and Magma® Design Automation Inc. ( http://www.magma-da.com ) announced that VeriSilicon's semiconductor IP products in logic, I/O cells and memories now support Magma IC design products Blast CreateT, Blast Fusion®, Blast RailT, Blast NoiseT and Blast PowerT. The companies have completed logical, physical and routability analysis of the VeriSilicon libraries and Magma users can now access library scripts directly from VeriSilicon. With immediate access to pre-qualified libraries and scripts, mutual customers can accelerate their design cycle.
"Magma is the acknowledged technology leader in electronic design automation (EDA). We are excited to work with Magma to support their design solution with our libraries for all major China-based wafer foundries, such as SMIC, GSMC, HHNEC and ASMC," said Wayne Dai, president and CEO of VeriSilicon Holdings. "This partnership will serve our mutual customers better."
"Our engineering team worked closely with VeriSilicon to ensure that their library products work with our design software," said Michael Ma, vice president of business development at Magma. "Delivering Magma pre-qualified semiconductor IPs as part of VeriSilicon's products enables the chip designers to have a complete integrated solution from RTL to GDSII, including crosstalk and power analysis."
VeriSilicon is a leading ASIC design foundry focusing on providing IP, design services and turnkey solutions for China based wafer foundries. VeriSilicon has operation centers in China (Shanghai), Taiwan (Neihu) and US (Silicon Valley) to service worldwide customers. VeriSilicon offers Standard Design Platforms including standard cell libraries, IO cell libraries, memory compilers, and analog solutions for China based wafer foundries such as Semiconductor Manufacturing International (Shanghai) Corporation (SMIC), Grace Semiconductor Manufacturing Corporation (GSMC), Advanced Semiconductor Manufacturing Corporation of Shanghai (ASMC), and Shanghai Hua Hong NEC Electronics Co., Ltd (HHNEC), covering 0.13um, 0.15um, 0.18um, 0.25um, 0.35um and 0.6um process technologies. For more information, please visit VeriSilicon at http://www.verisilicon.com or contact VeriSilicon directly at (408)-844-8560, or email: sales@verisilicon.com
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