CIMdata PLM Industry Summary Online Archive

14 September 2004

Implementation Investments

Synopsys' Proteus OPC Software Adopted by NEC Electronics for 90-Nanometer Production

Synopsys, Inc . announced the adoption of its ProteusT optical proximity correction (OPC) software at NEC Electronics Corporation for 90-nanometer (nm) production. "At the 90nm node, critical dimension (CD) accuracy becomes very important," said Hiroshi Sakuma, General Manager, Technology Foundation Development Operations Unit, NEC Electronics Corporation. "Proteus OPC software offers superior CD control and helps decrease turnaround times despite the increased complexity at 90 nanometers."

As process geometries continue to shrink to 90-nm and below, the ability to efficiently optimize the application of OPC plays an increasingly critical role in accelerating time-to-yield. In addition, OPC correction at smaller geometries requires significantly more processing time. Proteus' architecture provides near-linear scalability, when using clusters of inexpensive Linux based central processing unit (CPUs) that allows customers to reduce turn-around-time. Several leading-edge semiconductor companies have deployed Proteus to reduce mask synthesis turn-around-time from days to hours.

Synopsys' DFM product family addresses critical yield and manufacturability issues with its software products: Proteus mask synthesis, CATS® mask data preparation, SiVL® lithography verification, i-Virtual StepperT mask defect dispositioning and TaurusT TCAD. Synopsys leverages this expertise throughout its GalaxyT design platform implementation solution in order to help ensure that designs at 90nm and smaller geometries will meet key manufacturing requirements. Synopsys' DFM product family is the solution-of-choice for 130nm yield sensitive, high-value chips, worldwide. 80 percent of all sub-180nm microprocessors, 50 percent of all sub-180nm DRAMs, 80 percent of all sub-180nm FPGA and graphics chips, 75 percent of all sub-180nm cellular baseband chips produced use Proteus, and more than 80 percent of all photomasks produced use CATS.

 

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