CIMdata PLM Industry Summary Online Archive
13 May 2008
Product News
UMC and Mentor Graphics Introduce Foundry Design Kits (FDK) for Mixed-Mode and RF Technologies
UMC and Mentor Graphics Corporation announced they have partnered to offer a new series of analog/mixed-signal and RF foundry design kits (FDKs). The FDKs, containing comprehensive and validated building blocks at the transistor device level, help IC designers to jump-start design cycles on UMC’s 0.13um and 90nm MM/RF process nodes. Featuring Mentor’s analog/mixed-signal IC flow, the FDKs are poised to reduce time-to-market and optimize manufacturing success for analog, mixed mode and RF system-on-chip (SoC) ICs.
“Mentor’s FDKs for UMC’s advanced MM/RF process provide our customers with key technology to help them achieve first silicon success,” said Lee Chung, vice president of global marketing at UMC. “Since the FDKs are validated within Mentor’s complete mixed-signal SoC design flow, customers can gain competitive time-to-manufacturing advantages with the assurances of a proven, turn-key methodology and a proven path to silicon.”
The comprehensive FDKs include UMC Eldo simulation models, Calibre DRC, LVS and extraction technology files, schematic symbols and programmable device generators for supporting schematic driven layout and simulation, along with a set of configuration files for customization.
“We are pleased to partner with UMC to offer this comprehensive set of FDKs,” noted Jue-Hsien Chern, vice president of DSM at Mentor Graphics. “The combination of UMC’s production-proven, mixed-signal and RF processes and Mentor’s world-class, optimized mixed-signal design flow will enable our mutual customers to have optimal control and predictability over their SoC design and manufacturing.”
UMC's mainstream 0.13um process employs up to 8 layers of copper interconnects to enable a gate density of 220K gates/mm2. UMC’s 90nm process has been in customer production since March of 2003, making UMC the first dedicated foundry company to announce the delivery of working customer ICs built on this technology node. UMC and Mentor Graphics will continue to extend FDK offerings to 65nm and beyond by leveraging Mentor’s IC flow, which contains a unified design platform with a centralized design cockpit that allows seamless navigation throughout the entire analog mixed-signal IC design flow, from schematic capture, simulation and floor planning, to physical layout and final verification.
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