CIMdata PLM Industry Summary Online Archive
12 August 2008
Implementation Investments
Mentor Graphics Eldo Adopted by TSMC for Cell Library Characterization of 40 Nanometer Technology Node
Mentor Graphics Corporation announced that Taiwan Semiconductor Manufacturing Company Ltd. (TSMC) has selected Mentor’s Eldo® analog simulation tool to characterize cells in its 40 nanometer (nm) standard cell libraries.
“TSMC is committed to offering high quality, silicon-proven standard cell libraries to enable customers to design at 40nm technologies,” said ST Juang, senior director of design infrastructure marketing division, TSMC. “By adopting Eldo as our characterization SPICE engine, we are confident that we can deliver to this commitment.”
Advanced process technologies require that more process corners be characterized for each cell to accurately represent the process variation and physical effects on the design. More cell variants are also needed to accommodate different design considerations, such as cells for low power and cells for high speed. These advanced process technology requirements result in increased run time that must be mitigated by high performance SPICE simulation for library characterization.
“TSMC is the technology leader in advanced process technology so clearly Eldo’s role as TSMC’s simulator for 40nm standard cell characterization is an important one,” said Jue-Hsien Chern, vice president and general manager, Deep Submicron Division at Mentor.
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