CIMdata PLM Industry Summary Online Archive
7 October 2008
Product News
TSMC Adopts Mentor Graphics Calibre Equation-Based DRC Feature for Advanced Physical Verification
Mentor Graphics Corporation announced that TSMC and Mentor Graphics collaborated on physical verification (PV) solutions leveraging a new feature of the Calibre® nmDRC product called “Equation-Based DRC.” Equation-Based DRC allows users to check and correct issues that are very difficult to perform today with classic DRC methods. Continuous multi-dimensional (2D, 3D) functions allow integrated circuit (IC) developers to implement design-for-manufacturing (DFM) functionality directly within their PV flows.
TSMC has targeted general market availability of physical analysis decks supporting these new capabilities for its 32 nanometer (nm) process technologies. “The advanced capability of Calibre Equation-Based DRC is that it allows designers to perform important physical verification checks that are difficult with other approaches,” said S.T. Juang, senior director of design infrastructure marketing at TSMC. “Equation-Based DRC’s ability to model complex DFM phenomena in a simple way allows TSMC to create advanced physical analysis decks and utilities to help designers achieve higher first-pass yield, and to accelerate their ramp to volume production.”
Calibre customers can now incorporate complex manufacturing checks in a more accurate and straightforward manner with reduced PV deck size and improved designer debug productivity. Calibre customers employ equation-based DRC applications on the newest processes to address advanced lithography and manufacturability issues, and also on mature processes at 180nm and above in automotive, advanced mixed signal, and radio frequency applications. For example, Equation-Based DRC has enabled TSMC to create advanced DFM gate and interconnect checking applications. Other advanced-node applications that can be addressed using Equation-Based DRC include multi-dimensional compliance, poly corner rounding, gate uniformity, current density, and IR drop analysis and verification.
“Equation-Based DRC is just the latest example of how Calibre continues to revolutionize physical verification and analysis,” said Joe Sawicki, vice president and general manager for the Design-to-Silicon Division at Mentor Graphics. “As the industry market share leader and signoff standard, Calibre has a proven track record for speed, accuracy and reliability using conventional verification approaches. Now Equation-Based DRC adds a whole new dimension to the Calibre platform that addresses new design and manufacturing challenges and will allow designers to achieve higher first-pass yield.”
For more information see http://www.mentor.com/neweqDRC
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