CIMdata PLM Industry Summary Online Archive
15 July 2009
Product News
Magma Announces Talus-Based RTL-to-GDSII Low-Power Reference Flow for UMC's 40-Nanometer Process
Magma® Design Automation Inc. announced the availability of an integrated low-power IC implementation reference flow for UMC's advanced 40-nanometer (nm) process.
This reference flow supports the UMC 40-nm process and the UMC 40-nm low-leakage library. Based on the Magma Talus® IC implementation system and fully compliant with the Unified Power Format (UPF), it allows designers to address low-power nanometer design considerations during implementation and within a single environment, maximizing quality of results (QoR) while reducing turnaround time. Similar low-power reference flows for 90- and 65-nm processes are already available from Magma.
"UMC and Magma's long-standing partnership has resulted in many productive design support solutions for our customers," said Stephen Fu, director of the IP Development and Design Support Division at UMC. "Our latest effort is an integrated low-power IC implementation reference flow that gives designers a means to address low-power issues during the implementation phase of 40-nm designs."
"Our goal in working with UMC was to give project teams a way to address low-power nanometer design considerations with an integrated low-power IC implementation reference flow," said Premal Buch, general manager of Magma's Design Implementation Business Unit. "The Talus platform's unique integration accomplishes that goal while reducing overall turnaround time."
Availability
The reference flow is available from Magma now at no cost to Magma customers.
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