CIMdata PLM Industry Summary Online Archive
26 June 2012
Product News
SMIC and Synopsys Extend 40nm Low Power Capabilities with Reference Flow 5.0
Synopsys, Inc and Semiconductor Manufacturing International Corporation today announced availability of version 5.0 of their 40-nanometer (nm) RTL-to-GDSII reference design flow. This production-proven flow incorporates a broad range of automated low power and high-performance capabilities through Synopsys' entire tool suite, giving SMIC customers the differentiated performance and power results needed in today's chip designs.
The reference flow is the result of collaboration between SMIC and Synopsys Professional Services, leveraging Synopsys' experience and expertise in advanced chip design methodologies. The reference flow features new high-performance design techniques, including automated clock mesh synthesis, to increase performance and responsiveness of a system on chip (SoC), plus a gate array engineering change order (ECO) flow that allows a designer to quickly achieve design closure without having to start from scratch with a redesign. The reference flow also includes support for low power techniques such as power-aware clock tree synthesis, power gating and physical optimization, driven by the IEEE 1801 low power design intent standard.
"Designers require a reference flow that addresses both high-performance and low power requirements," said Tianshen Tang, SMIC's vice president of design service. "With the release of SMIC-Synopsys Reference Flow 5.0, we are enabling IC designers to accelerate their designs into manufacturing through the combination of SMIC's 40nm process technology and Synopsys' technology-leading design solutions."
"Customers are looking for tools and methodologies that allow them to deliver designs that meet their unique performance goals and requirements," said Rich Goldman, vice president of corporate marketing and strategic alliances at Synopsys. "Through our collaboration with SMIC, we are able to provide our mutual customers a proven reference flow and immediate access to both high-performance and low power design solutions tailored for SMIC's 40-nanometer low power process."
About SMIC
Semiconductor Manufacturing International Corporation ("SMIC"; NYSE: SMI; SEHK: 981) is one of the leading semiconductor foundries in the world and the largest and most advanced foundry in Mainland China, providing integrated circuit (IC) foundry and technology services at 0.35-micron to 40-nanometer. Headquartered in Shanghai, China, SMIC has a 300mm wafer fabrication facility (fab) and three 200mm wafer fabs in its Shanghai mega-fab, two 300mm wafer fabs in its Beijing mega-fab, a 200mm wafer fab in Tianjin, and a 200mm fab under construction in Shenzhen. SMIC also has customer service and marketing offices in the U.S., Europe, Japan, and Taiwan, and a representative office in Hong Kong. In addition, SMIC manages and operates a 300mm wafer fab in Wuhan owned by Wuhan Xinxin Semiconductor Manufacturing Corporation.
For more information, please visit www.smics.com
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